Description
Ostemer 220 Litho is developed for use with photomasks to manufacture high aspect ratio structures with an active surface of thiol-groups, that can be used for direct grafting of surface modifications after micro-patterning. For example, this resin is very attractive for creating capillary structures with tailored wicking speeds.
Note that the resin is liquid during exposure and therefore plastic masks that can be peeled off, or proximity mode exposure is recommended for stiff masks. This is a UV-cure system only and does not require additional heating.
- Rapid turn around times
- High aspect ratio structures
- Chemically reactive surfaces (thiol groups)
